Wafer Polishing

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Wafer Polishing

Kyma has over a decade of experience in crystalline wide bandgap semiconductor (WBGS) materials including GaN, AlN, Ga2O3, SiC, and sapphire. Kyma's fully equipped wafer facilities include a full suite of polishing tools for planarization, lapping, and chemical-mechanical polishing (CMP).

Kyma's CMP processes create epi-ready surfaces with surface RMS of <0.5nm. Additionally, wafer dicing services are available for sizes down to 5mm x 5mm.

Product Details

Features

  • Automated wafer polishing systems for compound semiconductors
  • Precise control over material removal rates and surface finish
  • Capabilities for a wide range of wafer sizes and materials
  • Advanced slurry delivery and conditioning systems
  • In-situ monitoring and endpoint detection
  • Customizable polishing recipes and process integration

Benefits

  • Superior surface planarity and ultra-low roughness
  • Exceptional total thickness variation (TTV) control
  • Minimized subsurface damage and defects
  • Improved yield and throughput for wafer production
  • Extended tool lifetime and reduced consumables costs
  • Versatile polishing solutions for diverse applications

Applications

  • Polishing of III-Nitride (GaN, AlN, InN) substrates and templates
  • Surface preparation for epitaxial growth processes
  • Polishing of SiC, Sapphire, and other compound semiconductor wafers
  • Planarization and smoothing of epitaxial layers and device structures
  • Wafer thinning and backside polishing for device fabrication
  • Polishing of optical and optoelectronic materials (lasers, LEDs)
  • Customized polishing solutions for research and pilot production

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